Reactive sputtering 翻译
WebReactive sputtering is defined by the reaction between atoms sputtered from a metal target and reactive gas molecules diffused from a discharge gas on the substrate to produce … WebFeb 8, 2012 · Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment - Volume 27 Issue 5. Skip to main content Accessibility help We use cookies to distinguish you from other users and to provide you with a better experience on our websites.
Reactive sputtering 翻译
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WebJun 20, 2013 · Sputtering is a common technique for Physical Vapor Deposition (PVD), one of the methods of producing Thin Film Coatings. Standard Sputtering uses a target of … Web• Understand the fundamental processes driving (reactive) magnetron sputtering • Develop strategies for dedicated experiments to unravel the complexity of reactive magnetron …
Web大量翻译例句关于"reactive sputtering" – 英中词典以及8百万条中文译文例句搜索。 reactive sputtering - 英中 – Linguee词典 在Linguee网站寻找 WebReactive sputtering is a technique used to produce thin film coatings with precisely regulated stoichiometry and structure for Physical vapor deposition (PVD). A sample (target) made of any desirable pure material is used in standard sputtering, along with an inert gas — typically argon. The resulting plasma either leaves the target material ...
Web67 ZnO thin films were grown by reactive magnetron sputtering. One advantage of reactive 68 sputtering is the use of high-purity zinc metal as a target (99.999 %) to grow a compound 69 material such as ZnO. Undoped silicon (100) substrates were heated at T = 1000 ºC for 24 hours 70 in air to grow an oxide layer. The substrates were ... Webreactive sputtering process - 英中 – Linguee词典. 在Linguee网站寻找. 推荐单词"reactive sputtering process"的翻译. 复制. DeepLTranslator词典. ZH. Open menu. Translator. …
WebAug 1, 1990 · Using an improved reactive sputter deposition technique, zirconium dioxide is deposited on cooled and uncooled substrates at low, medium, and high rates of 51.7, 95.4, and 152.4 nm/min, respectively. The films are deposited by sputtering a Zr target in an oxygen--argon plasma. The Zr target remains in the metallic state.
WebReactive sputtering is a commonly used process to fabricate compound thin film coatings on a wide variety of different substrates. The industrial applications request high rate … inbound agenda 2022WebOct 27, 1998 · Aluminum oxide films were produced by reactive dc magnetron sputtering of Al in Ar+O 2.The composition of the films was characterized by Rutherford backscattering measurements. Stoichiometric films possessed excellent optical properties with a refractive index of ∼ 1.6 for visible and near-infrared light. It was possible to produce stoichiometric … inbound against permanent connectionWebMay 12, 2024 · Thus, the reactive sputtering technology, which could introduce Ti 2 O 3 and Ti 3 O 5 into the TiO 2 films, might adjust the light absorption to the visible range. The films containing simply ... inbound agreement formatWebSep 27, 2024 · Yttria-stabilized zirconia (YSZ) thin films were deposited using direct current (reactive and metallic) and radio frequency magnetron sputtering. The effect of the deposition technique and annealing treatment on the microstructure and crystallinity of the thin films was assessed. Using the films produced in this work, oxygen gas sensors were … in and out excel templatehttp://www.ichacha.net/reactive%20magnetron%20sputtering.html inbound airporthttp://www.ichacha.net/co-sputtering.html in and out exercise coreWebReactive sputtering is a process that allows compounds to be deposited by introducing a reactive gas (typically oxygen or nitrogen) into the plasma which is typically formed by an inert gas such as argon (most common), … inbound albany ga